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The Program 2024

High-profile researchers in the field of HiPIMS has been invited.

They will give oral presentations. 
You will be able to interaction with
the speakers, exhibitors, and breakout room presenters as with all participants of the workshop.

* Please note that the time schedule of  Day 2 is different with Day 1 and 3.

Color code of the categories

Plasma

Modeling & simulations

Processes

Film

Applications

Time zones

CET: UTC +1,  US/CA: UTC-7, CHN :UTC+8, JPN: UTC+9  

March 11, 2024
5:00~10:30 UTC

March 12, 2024
12:00~17:30 UTC

March 13, 2024
5:00~10:30 UTC

5:00 -5:50 UTC

Exhibits and discussions

5:50 -6:00 UTC

Opening of the workshop

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Breakout room presenters

12:00 -13:00 UTC

Exhibits and discussions

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Breakout room presenters

5:00 -6:00 UTC

Exhibits and discussions

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Breakout room presenters

6:00 -6:20 UTC

 

 

 

 

 

Johan Böhlmark,

Ionautics AB, Sweden

 

Historical on HiPIMS in cutting tools

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6:20 -6:40 UTC

 

 

 

 

 

 

Ralf Bandorf, Fraunhofer IST, Germany

Industrial Scale Reactive HIPIMS of Oxide Materials

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6:40 -6:50 UTC

 

 

 

 

 

 

Dermot Monaghan, Gencoa, UK

Optimizing magnetic design for HiPIMS processes

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6:50 -7:00 UTC

 

 

 

 

 

 

Thomas Schütte, PLASUS, Germany

Next level of process control for HiPIMS application: Continuous pulse-resolved spectroscopic plasma monitoring with the new EMICON FS system

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13:00 -13:20 UTC

 

 

 

 

 

Tomas Kozak,

University of West Bohemia, Czech Republic

Modelling of HiPIMS discharges via particles: density distribution of atoms and ions

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13:20 -13:40 UTC

 

 

 

 

 

 

Pierre-Yves Jouan, Nantes University, France

Time-Resolved Optical Analysis of e-HiPIMS Discharge

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13:40 -14:00 UTC

 

 

 

 

 

 

Ching-Lien Hsiao, Linköping University, Sweden

Magnetron sputter epitaxy of nitride semiconductor thin films and the effect of HiPIMS-grown AlN buffer layers

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6:00 -6:20 UTC

Hicham Larhlimi, Ionbond - IHI group, Netherlands

 

Effect of the carbon content on the mechanical, tribological, and anti-corrosion properties of TiC

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6:20 -6:40 UTC

 

 

 

 

 

 

Takeo Nakano, Seikei University, Japan

Application of triode HPPMS for fabrication of Spindt-type micro vacuum electron emitter array

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6:40 -6:50 UTC

 

 

 

 

 

 

Radek Zemlicka, Evatec, Switzerland

Enhancing Reactive HiPIMS Process Control:
A Method for Large Targets and Diverse Parameters

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6:50 -7:00 UTC

 

 

 

 

 

 

Patrick Sturm,

TOFWERK, Switzerland

Energy-Resolved Time-of-Flight Mass Spectrometry for Bulk Plasma Analysis

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7:00 -8:00 UTC

Exhibits and discussions

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Breakout room presenters

14:00 -15:00 UTC

Exhibits and discussions

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Breakout room presenters

7:00 -8:00 UTC

Exhibits and discussions

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Breakout room presenters

8:00 -8:20 UTC

Bocong Zheng, Beijing Institute of Technology, China

Kinetic investigation on HiPIMS discharges in 1D particle simulation

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8:20 -8:40 UTC

Jyotish Patidar,EMPA, Switzerland

Metal-ion-synchronized HiPIMS of piezoelectric AlScN films

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8:40 -9:00 UTC

Martin Cada, Institute of Physics of the Czech Academy of Sciences, Czech Republic

Total ion flux and IEDF measurement of HiPIMS+Arc hybrid deposition process of ta-C

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15:00 -15:20 UTC

Sergej Kucheyev, Lawrence Livermore Nat. Lab, US

Deposition of ultrathick heavy-metal alloys by HiPIMS

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15:20 -15:40 UTC

Pedro Renato Tavares Avila, Polytechnique Montréal, Canada

In-situ monitoring of stress development in HiPIMS deposited TiAlN films

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15:40 -16:00 UTC

Julian Held, University of Minnesota, US

Ionization of sputtered species for different target materials

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8:00 -8:20 UTC

Flyura Djurabekova, University of Helsinki, Finland

Molecular dynamics study of growth mechanisms of Nb on Cu for superconducting thin film applications during direct current and high power impulse magnetron sputtering deposition

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8:20 -8:40 UTC

Babak Bakhit, University of Cambridge, UK

Hybrid DCMS/HiPIMS co-sputtering: a proper tool for engineering nanostructure and properties of diboride thin films

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8:40 -9:00 UTC

Jörg Vetter, S3 Consulting, Germany

Industrial aspects of HiPIMS technology:  processes and applications

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9:00 -10:30 UTC

Exhibits and discussions

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Breakout room presenters

16:00 -17:30 UTC

     Exhibits and discussions

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Breakout room presenters

9:00 - 9:10 UTC

Closing of the workshop

9:10 -10:30 UTC

     Exhibits and discussions

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Breakout room presenters
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