The Program 2024
High-profile researchers in the field of HiPIMS has been invited.
They will give oral presentations.
You will be able to interaction with
the speakers, exhibitors, and breakout room presenters as with all participants of the workshop.
* Please note that the time schedule of Day 2 is different with Day 1 and 3.
Time zones
Europe: CET: UTC +1
North America: PST: UTC-8, CST: UTC-6, EST: UTC-5,
Asia: CST: UTC+8, JST: UTC+9
Color codes of the categories
Plasma
Modeling & simulations
Processes
Films
Applications
March 11, 2024
5:00～10:30 UTC
March 12, 2024
12:00～17:30 UTC
March 13, 2024
5:00～10:30 UTC
5:50 -6:00 UTC
Opening of the workshop
6:00 -6:20 UTC
Johan Böhlmark
Ionautics AB,
Sweden
Historical on HiPIMS in cutting tools
6:20 -6:40 UTC
Ralf Bandorf
Fraunhofer IST, Germany
Industrial Scale Reactive HIPIMS of Oxide Materials
6:40 -6:50 UTC
Dermot Monaghan
Gencoa Ltd.,
UK
Optimizing magnetic design for HiPIMS processes
6:50 -7:00 UTC
Thomas Schütte
PLASUS GmbH,
Germany
Next level of process control for HiPIMS application: Continuous pulse-resolved spectroscopic plasma monitoring with the new EMICON FS system
13:00 -13:20 UTC
Tomas Kozak
University of West Bohemia,
Czech Republic
Modelling of HiPIMS discharges via particles: density distribution of atoms and ions
13:20 -13:40 UTC
Pierre-Yves Jouan
Nantes University, France
Time-Resolved Optical Analysis of e-HiPIMS Discharge
13:40 -14:00 UTC
Ching-Lien Hsiao
Linköping University, Sweden
Magnetron sputter epitaxy of nitride semiconductor thin films and the effect of HiPIMS-grown AlN
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6:00 -6:20 UTC
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Hicham Larhlimi
Ionbond - IHI group, Netherlands
Effect of the carbon content on the mechanical, tribological, and anti-corrosion properties of TiC films deposited using a HiPIMS discharge
6:20 -6:40 UTC
Takeo Nakano
Seikei University, Japan
Application of triode HPPMS for fabrication of Spindt-type micro vacuum electron emitter array
6:40 -6:50 UTC
Radek Zemlicka
Evatec, Switzerland
Enhancing Reactive HiPIMS Process Control:
A Method for Large Targets and Diverse Parameters
6:50 -7:00 UTC
Patrick Sturm
TOFWERK, Switzerland
Energy-resolved Time-of-Flight mass spectrometry for bulk plasma analysis
8:00 -8:20 UTC
Bocong Zheng
Beijing Institute of Technology,
China
Kinetic investigation on HiPIMS discharges in 1D particle simulation
8:20 -8:40 UTC
Jyotish Patidar
EMPA, Switzerland
Metal-ion-synchronized HiPIMS of piezoelectric AlScN films
8:40 -9:00 UTC
Martin Cada
Institute of Physics of the Czech Academy of Sciences,
Czech Republic
Total ion flux and IEDF measurement of HiPIMS+Arc hybrid deposition process
of ta-C
15:00 -15:20 UTC
Sergej Kucheyev
Lawrence Livermore Nat. Lab, USA
Deposition of ultrathick heavy-metal alloys by HiPIMS
15:20 -15:40 UTC
Pedro Renato Tavares Avila
Polytechnique Montréal, Canada
In-situ monitoring of stress development in HiPIMS deposited TiAlN films
15:40 -16:00 UTC
Julian Held
University of Minnesota,
USA
Ionization of sputtered species for different target materials
8:00 -8:20 UTC
Flyura Djurabekova
University of Helsinki, Finland
Molecular dynamics study of growth mechanisms of Nb on Cu for superconducting thin film applications during direct current and high power impulse magnetron sputtering deposition
8:20 -8:40 UTC
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Babak Bakhit
University of Cambridge,
UK
Hybrid DCMS/HiPIMS co-sputtering: a proper tool for engineering nanostructure and properties of diboride thin films
8:40 -9:00 UTC
Jörg Vetter
S3 Consulting, Germany
Industrial aspects of HiPIMS technology: processes and applications
9:00 -9:10 UTC
Closing of the workshop
Breakout room
presentations list
Day 1
(3/11)
Rajesh Ganesan - The University of Sydney, Australia
“Bipolar HiPIMS Bursts: Breaking the Back-Attraction and firing the plasma flares”
Anna W. Oniszczuk - TRUMPF Hüttinger, Poland
“Active current control in HIPIMS pulses, benefits in process optimization”
Martins Zubkins- University of Latvija, Latvija
“Photochromic yttrium oxyhydride (YHO) thin films"
Day 2
(3/12)
Kateryna Barynova - University of Iceland, Iceland
“On working gas rarefaction in high power impulse magnetron sputtering”
Arcadie Sobetkii - SC MGM Star Construct SRL, Romania
“HiPIMS multi-layer coating of Ti-TiC-TiC/DLC-DLC”
Day 3
(3/13)
Dominik Tiedemann - Robert Bosch Manufacturing Solutions GmbH, Germany
“Bosch Coating Technology: Microwave assisted sputtering as alternative for HiPIMS”
Swetha Suresh Babu - University of Iceland, Iceland
“High Power impulse Magnetron sputtering of Zirconium and Tungsten Target”
Luo Yang- Beihang University, China
“Plasma potential and ion energy characteristics in BP-HiPIMS discharge with double layer"