The Program 2026
High-profile researchers in the field of HiPIMS has been invited.
They will give oral presentations.
You will be able to interaction with
the speakers, exhibitors, and breakout room presenters as with all participants of the workshop.
* Please note that the time schedule of Day 2 is different from Day 1 and 3.
Time zones
Europe: CET: UTC +1
North America: PST: UTC-8, CST: UTC-6, EST: UTC-5,
Asia: CST: UTC+8, JST: UTC+9
Color codes of the categories
Plasma
Modeling & simulations
Processes
Films
Applications
March 9, 2026
6:00～10:30 UTC
March 10, 2026
12:00～16:30 UTC
March 11, 2026
6:00～10:30 UTC
5:00 - 5:50 UTC
Zoom Meeting Opens
Exhibits /Mingling
11:00 -12:00 UTC
Zoom Meeting Opens
Exhibits /Mingling
5:00 - 6:00 UTC
Zoom Meeting Opens
Exhibits /Mingling
5:50 - 6:00 UTC
Opening Remarks
6:00 - 6:20 UTC
André Anders
Plasma Engineering LLC, USA
HiPIMS at the transition between glow and ohmic discharge
6:20 -6:40 UTC
Claudiu Costin
Alexandru Ioan Cuza University of Iasi, Romania
On the secondary electron emission efficiency for high-power magnetrons
6:40 - 6:50 UTC
Thomas Schütte
PLASUS GmbH,
Germany
Real-time optimization of HIPIMS processes using pulse-resolved spectroscopic and electrical plasma monitoring
6:50 - 7:00 UTC
Johan Böhlmark
Ionautics AB, Sweden
Industrial HiPIMS
-Process challenges and
innovations
12:00 -12:20 UTC
Jaroslav Vlcek
University of West Bohemia in Pilsen, Czech Republic
Effective scalable technique for low-temperature deposition of thermochromic VO2-based coatings for energy-saving smart windows
12:20 -12:40 UTC
Charles Ballage
Université Paris-Saclay, France
Microsecond ion flux mapping in HiPIMS via magnetized QCM probe
12:40 -12:50 UTC
Anna Oniszczuk
TRUMPF Hüttinger
Sp. Z. O. O. ,
Poland
Where Coating Quality Meets Semiconductor Applications
12:50 - 13:00 UTC
Andreas Lümkemann
PLATIT AG.,
Switzerland
Twin Rotating Magnetron for Smart, Application-Driven HiPIMS Coatings
6:00 -6:20 UTC
Franck Delmotte
Laboratoire Charles Fabry, Université Paris-Saclay, France
Short-period x-ray multilayer mirrors using HIPIMS deposition method
6:20 -6:40 UTC
Erdong Chen
Tokyo Metropolitan University, Japan
Understanding Reactive Mode Transitions in Multi-Pulse HiPIMS Discharges: Toward Stable Process Control of VO₂ Deposition
6:40 - 7:00 UTC
Rachid Oubaki
Mohammed VI Polytechnic University (UM6P), Morocco
Comparative DcMS and HiPIMS Sputtering of Mo and CIGS Thin Films for Photovoltaic Applications
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8:00 - 8:20 UTC
Dongho Lee
Korea Advanced Institute of Science & Technology (KAIST), Korea
Fast electrons at the high-power impulse magnetron sputtering with cathode voltage reversal
8:20 - 8:40 UTC
Alan Abdalad Vianna
CERN, Switzerland/ CNPEM, Brazil
Shaping HiPIMS Pulses to Control Hydrogen Incorporation in Amorphous Carbon Films for Particle Accelerators
8:40 - 9:00 UTC
Takayuki Ohta
Meijo University, Japan
Fabrication of Thin Film Transistors using Indium Gallium Zinc Oxide film deposited by High-Power Impulse Magnetron Sputtering
14:00 - 14:20 UTC
Matej Fekete
University of Brno, Czech Republic
From Plasma Parameters to Thin Film Properties: Exploring Aluminum Solubility in the TiAlON Materials System
14:20 - 14:40 UTC
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Nastaran Behravan
Silicon Austria Labs GmbH, Austria/ Linköping University, Sweden
Gas Rarefaction Effects on Metal Ion Acceleration in Epitaxial AlN Growth on Silicon
14:40 - 15:00 UTC
Stéphane Lucas
Innovative Coating Solutions (ICS)/ University of Namur, Belgium
Virtual Coater by fast computer modelling algorithms: from DC to HIPIMS film growth
8:00 - 8:20 UTC
Nathan Rodkey
Empa, Swiss Federal Laboratories for Materials Science and Technology, Switzerland
Autonomous Sampling and SHAP Interpretation of Deposition-Rates in Bipolar HiPIMS
8:20 - 8:40 UTC
Mina Farahani
University of West Bohemia, Czech Republic
From chopped unipolar to chopped bipolar HiPIMS: tailoring ion acceleration and its impact on AlN film growth
8:40 - 9:00 UTC
Blank
Blank
8:40 - 8:50 UTC
Closing Remarks
Breakout room
presentations list
Day 1
(3/9)
Martin Ondryas - Mazaryk University, Czech Republic
“Comparative Analysis of Ionized Flux Fractions and Deposition Rates in Unipolar, Bipolar, and Burst HiPIMS Discharges”
Ivana Venkrbcova - FZU - Institute of Physics, Czech Republic
“Copper-iron oxide semiconductor thin films deposited by ECWR-assisted reactive HiPIMS”
Mihaela Dinu - National Institute for Optoelectronics-INOE2000, Romania
“Electrochemical evaluation of Light (TiCrAl0.5NbCu)CxNy High-Entropy Coatings Deposited by DCMC/HiPIMS hybrid reactive technique”
Day 2
(3/10)
Xiao Li- FZU - Institute of Physics, Czech Republic
“Plasma characterization for reactive HiPIMS process regulation of vanadium oxides”
Jonas Müller - Fraunhofer IWM, Germany
“Optical Emission Spectroscopy of Superimposed HiPIMS + RF”
Chiara Appelt - Karlsruher Institut für Technologie, Germany
“Synthesis and Analysis of Multicomponent Thin Films via Reactive and Non‑Reactive HiPIMS Co‑Sputtering”
Day 3
(3/11)
Philipp Dörflinger - TU Vienna, Austria
“Enabling Low-Temperature Ti3SiC2 MAX Phase Synthesis by Reactive HiPIMS”
Syed Muhammad Raza Zaidi - Tokyo Metropolitan University, Japan
“Reactive Gas-Phase Synthesis of Multicomponent (TiNbZrTa)Nₓ
Nanoparticles by High-Power Impulse Hollow Cathode Sputtering”
Dominik Gutnik - Technical University of Leoben, Austria
“Atomic Layer Deposition on porous Cu nanostructures deposited through High-Power Impulse Hollow Cathode Sputtering"